Aquis Nitrogen Spray / Drying Guns (ANG)

AQUIS Precision Nitrogen Spray Gun: High-Purity Gas Dispensing Solution

The AQUIS Nitrogen Spray Gun, constructed of high-purity PVDF (polyvinylidene fluoride), delivers precise, contamination-free dispensing of nitrogen and inert gases, engineered specifically for laboratories, cleanrooms, and industrial facilities where purity is critical. Essential for semiconductor manufacturing, pharmaceutical production, and chemical processing applications where reliable, clean gas delivery matters.

Operating Specifications:

• Operating Pressure: 1 psi - 80 psi (5.5 bar)
• Temperature Range: 0°F to +200°F
• Flow Rate: 0 - 120 ft³/hr Full Open @ 80 psi
• Manufactured and assembled in USA - Compliant with Build America, Buy America Act (BABA)

Key Engineering Features:

Built with a high-purity PVDF body and Modified PTFE components, this spray gun ensures chemical compatibility and eliminates contamination risks. The innovative single-piece sealing design eliminates contamination from O-rings and elastomeric seals while reducing maintenance and extending service life.

Construction:

• Body: 100% Virgin PVDF
• Sealing Component: Modified PTFE
• Lever Handle and Hanger Hook: Black PVDF
• Spring: 316 SS (Non-Wetted)

Safety and Performance:

• Integral PVDF 0.80 Micron Filter for incoming gas filtration
• OSHA-compliant pressure relief system prevents pressure buildup
• Ergonomic design with adjustable/removable hanger for practical daily use
• Engineered cap/nozzle design provides uniform gas distribution

Installation Options:

Available with ¼" female NPT, 3/8" female NPT, or 3/8" flare connections. Available as spray gun only or complete assembly with Polyurethane (PU), FEP, or PFA tubing in coiled or straight configurations to meet specific purity and chemical resistance requirements.

The AQUIS Nitrogen Spray Gun combines durability and precision to meet strict purity standards. For semiconductor cleaning, pharmaceutical manufacturing, or specialized laboratory work, it delivers consistent, contamination-free performance in challenging chemical environments.